Image of the Week - April 19, 2001

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Plasma-Etched Silicon Wafer

This is a plasma-etched silicon wafer, produced from an image of natural sand. The silicon wafer was etched to a depth of 50 micrometers. The image was acquired on the ESEM in the Microscopy Suite.

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Contact: chomsuri@students.uiuc.edu

Uploaded Thu Apr 19 11:37:37 2001 by Scott Jay Robinson

Updated Fri Jan 22 10:07:27 2010 by Daniel E. Weber