Gallery

Anisotropic Etching of a Bulk Silicon Wafer

Download original media

Media Details

Created 01/18/2005

ESEM image of smooth sidewalls of single crystal silicon formed by anisotropic wet etching. The underlying Si was chemically etched anisotropically using KOH/H 2 O solution.

Credits

  • John A. Rogers , 3D Micro- and Nanosystems, Beckman Institute
  • Jong-Hyun Ahn , 3D Micro- and Nanosystems, Beckman Institute
Back to all images