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Reactive Ion Etching Pattern

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Created 02/15/2005

In this scanning electron micrograph we see an example of what may occur when anisotropic conditions for reactive ion etching are not achieved. The horizontal portions of the raised areas in this image are photoresist that was left floating above the silicon surface.

Credits

  • Jeff Kim , 3D Micro- and Nanosystems, Beckman Institute
  • John A. Rogers , 3D Micro- and Nanosystems, Beckman Institute
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