University of illinois Urbana-Champaign

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Plasma-Etched Silicon Wafer

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Created 4/19/2001

This is a plasma-etched silicon wafer, produced from an image of natural sand. The silicon wafer was etched to a depth of 50 micrometers. The image was acquired on the ESEM in the Microscopy Suite.


  • Cheema Chomsurin , Department of Civil and Environmental Engineering
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