Plasma-Etched Silicon Wafer

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Created 4/19/2001 5:00:00 AM

This is a plasma-etched silicon wafer, produced from an image of natural sand. The silicon wafer was etched to a depth of 50 micrometers. The image was acquired on the ESEM in the Microscopy Suite.

Credits

• Cheema Chomsurin , Department of Civil and Environmental Engineering